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11 . Conference
Metrology characterization for self-aligned double patterning.
저자
by
Berger, Ami
;
Latinsky, Sergey
;
Bar-Zvi, Maayan
;
Peltinov, Ram
;
Shu, Jen
, et al.
소스
Proceedings of SPIE; Nov2008, Issue 1, p692211-692211-7, 7p
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17 . Conference
45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning.
저자
by
Dai, Huixiong
;
Bencher, Chris
;
Chen, Yongmei
;
Woo, Hyungje
;
Ngai, Chris
, et al.
소스
Proceedings of SPIE; Nov2008, Issue 1, p692421-692421-7, 7p
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17 . Conference
Accelerating yield ramp through design and manufacturing collaboration.
저자
by
Sarma, Robin C.
;
Dai, Huixiong
;
Smayling, Michael C.
;
Duane, Michael P.
.
소스
Proceedings of SPIE; Nov2004, Issue 1, p128-136, 9p
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16 . Academic Journal
Progress in the Synthesis of Primary Anilines via C-H Bond Functionalization
저자
by
Xu, Linlin
;
Xu, Hui
;
Lin, Haixia
;
Dai, Huixiong
.
소스
CHINESE JOURNAL OF ORGANIC CHEMISTRY
; AUG 25 2018, 38 8, p1940-p1948, 9p.
Scopus
Web of Science
JCR 저널정보
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16 . Academic Journal
Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning.
저자
by
Yi, He
;
Bao, Xin-Yu
;
Zhang, Jie
;
Bencher, Christopher
;
Chang, Li-Wen
, et al.
소스
Advanced Materials; Jun2012, Vol. 24 Issue 23, p3107-3114, 8p
Full Text (Wiley)
Web of Science
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17 . Periodical
Novel and cost-effective multiple patterning technology by means of invisible SiOxNy hardmask
저자
by
Wallow, Thomas I.
;
Hohle, Christoph K.
;
Jang, Linus
;
Moon, Young Joon
;
Kim, Ryoung-Han
, et al.
소스
Proceedings of SPIE; March 2014, Vol. 9051 Issue: 1 p90510Y-90510Y-13, 8960504p
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17 . Periodical
Understanding device impact of line edge/width roughness in frequency domain
저자
by
Mason, Mark E.
;
Sturtevant, John L.
;
Xie, Peng
;
Ren, He
;
Nainani, Aneesh
, et al.
소스
Proceedings of SPIE; April 2013, Vol. 8684 Issue: 1 p86840J-86840J-7, 781568p
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17 . Periodical
Towards manufacturing a 10nm node device with complementary EUV lithography
저자
by
Naulleau, Patrick P.
;
Hermans, Jan V.
;
Dai, Huixiong
;
Niroomand, Ardavan
;
Laidler, David
, et al.
소스
Proceedings of SPIE; April 2013, Vol. 8679 Issue: 1 p86791K-86791K-13, 8592323p
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17 . Periodical
Process and proximity correction, and verification for extreme ultraviolet lithography
저자
by
Naulleau, Patrick P.
;
Perçin, Gökhan
;
Dai, Huixiong
;
Huang, Hsu-Ting
;
Liu, Anwei
, et al.
소스
Proceedings of SPIE; April 2013, Vol. 8679 Issue: 1 p86790X-86790X-7, 781118p
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17 . Periodical
Free form source and mask optimization for negative tone resist development for 22nm node contact holes
저자
by
Coskun, Tamer H.
;
Dai, Huixiong
;
Kamat, Vishnu
;
Hsu, Ching-Mei
;
Santoro, Gaetano
, et al.
소스
Proceedings of SPIE; March 2012, Vol. 8326 Issue: 1 p83260V-83260V-14, 8242755p
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