Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol 36, iss 6 Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, vol 36, iss 6 Tobin, JG; Yu, S-W; Qiao, R; Yang, WL; & Shuh, DK. (2018). Probing covalency with oxidant K edge x-ray absorption spectroscopy of UF4 and UO2. Journal of Vacuum Science & Technology A, 36(6), 061403-061403. doi: 10.1116/1.5046947. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/9vb261sc