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1 . Academic Journal
Acoustic power dependent detachment of PSL particles adhered to glass surfaces by dissolved gas and anionic surfactant in an ultrasonic field
저자
by
Sahoo, Bichitra Nanda
;
Yerriboina, Nagendra Prasad
;
Kang, Bong-kyun
;
Klipp, Andreas
;
Kim, Tae-Gon
, et al.
소스
In
Colloids and Surfaces A: Physicochemical and Engineering Aspects
20 August 2023 671
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7 . Academic Journal
Theoretical validation of inhibition mechanisms of benzotriazole with copper and cobalt for CMP and post-CMP cleaning applications
저자
by
Ryu, Heon-Yul
;
Lee, Chi Ho
;
Lee, Sang Uck
;
Hamada, Satomi
;
Yerriboina, Nagendra Prasad
, et al.
소스
In
Microelectronic Engineering
1 June 2022 262
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7 . Academic Journal
Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant
저자
by
Sahoo, Bichitra Nanda
;
Han, So Young
;
Kim, Hyun-Tae
;
Ando, Keita
;
Kim, Tae-Gon
, et al.
소스
In
Ultrasonics Sonochemistry
January 2022 82
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7 . Academic Journal
Investigation of the effect of different cleaning forces on Ce-O-Si bonding during oxide post-CMP cleaning
저자
by
Sahir, Samrina
;
Yerriboina, Nagendra Prasad
;
Han, So-Young
;
Han, Kwang-Min
;
Kim, Tae-Gon
, et al.
소스
In
Applied Surface Science
15 April 2021 545
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7 . Academic Journal
Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning
저자
by
Sahir, Samrina
;
Yerriboina, Nagendra Prasad
;
Han, So-Young
;
Kim, Tae-Gon
;
Mahadev, Niraj
, et al.
소스
In
Microelectronic Engineering
15 March 2021 241
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7 . Academic Journal
Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process
저자
by
Lee, Jung-Hwan
;
Poddar, Maneesh Kumar
;
Han, Kwang-Min
;
Ryu, Heon-Yul
;
Yerriboina, Nagendra Prasad
, et al.
소스
In
Polymer Testing
October 2020 90
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7 . Academic Journal
Hybrid DHF and N2 jet spray cleaning for silicon nitride and metal layer DRAM patterns
저자
by
An, Kook-Hyun
;
Yerriboina, Nagendra Prasad
;
Poddar, Maneesh Kumar
;
Kim, Tae-Gon
;
Lee, Dong-Kyu
, et al.
소스
In
Microelectronic Engineering
15 February 2020 220
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7 . Academic Journal
Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process
저자
by
Jeong, Yeon-Ah
;
Poddar, Maneesh Kumar
;
Ryu, Heon-Yul
;
Yerriboina, Nagendra Prasad
;
Kim, Tae-Gon
, et al.
소스
In
Microelectronic Engineering
15 October 2019 218
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7 . Academic Journal
Ultrasound-induced break-in method for an incoming polyvinyl acetal (PVA) brush used during post-CMP cleaning process
저자
by
Lee, Jung-Hwan
;
Poddar, Maneesh Kumar
;
Yerriboina, Nagendra Prasad
;
Ryu, Heon-Yul
;
Han, Kwang-Min
, et al.
소스
In
Polymer Testing
September 2019 78
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7 . Academic Journal
Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning
저자
by
Lee, Jung-Hwan
;
Purushothaman, Muthukrishnan
;
Han, Kwang-Min
;
Ryu, Heon-Yul
;
Yerriboina, Nagendra Prasad
, et al.
소스
In
Polymer Testing
August 2019 77
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