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1 . Periodical
Mask error and its contribution to OPC model error for an EUV via layer
저자
by
Naulleau, Patrick P.
;
Gargini, Paolo A.
;
Itani, Toshiro
;
Ronse, Kurt G.
;
Lyons, Adam
, et al.
소스
Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500E-127500E-10, 12622511p
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7 . Academic Journal
22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool
저자
by
Naulleau, Patrick P.
;
Anderson, Christopher N.
;
Chiu, Jerrin
;
Denham, Paul
;
George, Simi
, et al.
소스
In
Microelectronic Engineering
2009 86(4):448-455
Full Text (ScienceDirect)
Web of Science
Scopus
JCR 저널정보
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7 . Periodical
Extreme ultraviolet lithography reticle local CD uniformity correlation to wafer local CD uniformity
저자
by
Kasprowicz, Bryan S.
;
Liang, Ted
;
Lyons, Adam
;
Wallow, Tom
;
Nam, Dong-Seok
, et al.
소스
Proceedings of SPIE; December 2022, Vol. 12293 Issue: 1 p122930M-122930M-12, 12170083p
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7 . Conference
Photoresist challenges and potential solutions for the 32 nm half-pitch node and beyond
저자
by
Wurm, Stefan
;
Byers, Jeffrey
;
Zimmerman, Paul
;
Wallow, Tom
;
Dean, Kim
.
소스
2007 Digest of papers Microprocesses and Nanotechnology Microprocesses and Nanotechnology, 2007 Digest of papers. :428-429 Nov, 2007
Full Text (IEEE)
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7 . Conference
Mask error and its contribution to OPC model error for an EUV via layer.
저자
by
Lyons, Adam
;
Wallow, Tom
;
Spence, Chris
;
Connolly, Bríd
;
Beurgel, Christian
, et al.
소스
Proceedings of SPIE; 12/19/2023, Vol. 12750, p127500E-127500E-10, 1p
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7 . Conference
Recent results from the Berkeley 0.3-NA microfield exposure tool
저자
by
Wallow, Tom
.
소스
Conference: Advanced Lithography 2007, San Jose, CA, Feb. 25 - March 3, 2007
Open Access (SciTech Connect)
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3 . Academic Journal
Pushing EUV lithography development beyond 22-nm half pitch
저자
by
Wallow, Tom
.
소스
Journal of Vacuum Science and Technology B
Open Access (SciTech Connect)
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3 . Periodical
Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations
저자
by
Felix, Nelson M.
;
Lio, Anna
;
Lyons, Adam
;
Long, Luke
;
Wallow, Tom
, et al.
소스
Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116090C-116090C-12, 11492923p
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7 . Periodical
Mask contribution to OPC model accuracy
저자
by
Naulleau, Patrick P.
;
Gargini, Paolo A.
;
Itani, Toshiro
;
Ronse, Kurt G.
;
Lyons, Adam
, et al.
소스
Proceedings of SPIE; September 2020, Vol. 11517 Issue: 1 p115171D-115171D-11, 11401941p
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7 . Conference
Massive metrology using fast e-beam technology improves OPC model accuracy by >2x at faster turnaround time.
저자
by
Qian Zhao
;
Wang, Lei
;
Wang, Jazer
;
ChangAn Wang
;
Hong-Fei Shi
, et al.
소스
Proceedings of SPIE; 2018, Vol. 10585, p1-9, 9p
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