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1 . Academic Journal
300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition
저자
by
Clerix, J.J.
;
Warad, L.
;
Hung, J.
;
Hody, H.
;
Van Roey, F.
, et al.
소스
In
Applied Surface Science
30 July 2023 626
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Web of Science
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7 . Conference
Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
저자
by
Veloso, A.
;
Demuynck, S.
;
Ercken, M.
;
Goethals, A. M.
;
Locorotondo, S.
, et al.
소스
2009 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2009 IEEE International. :1-4 Dec, 2009
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7 . Conference
Full-field EUV and immersion lithography integration in 0.186μm2 FinFET 6T-SRAM cell
저자
by
Veloso, A.
;
Demuynck, S.
;
Ercken, M.
;
Goethals, A. M.
;
Demand, M.
, et al.
소스
2008 IEEE International Electron Devices Meeting Electron Devices Meeting, 2008. IEDM 2008. IEEE International. :1-4 Dec, 2008
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7 . Conference
Imaging performance of the EUV alpha semo tool at IMEC.
저자
by
Lorusso, G. F.
;
Hermans, J.
;
Goethals, A. M.
;
Baudemprez, B.
;
Van Roey, F.
, et al.
소스
Proceedings of SPIE; Nov2008, Issue 1, p69210O-69210O-10, 10p
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7 . Conference
Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist and EUV reticles.
저자
by
Hendrickx, E.
;
Goethals, A. M.
;
Niroomand, A.
;
Jonckheere, R.
;
Van Roey, F.
, et al.
소스
Proceedings of SPIE; Nov2008, Issue 1, p714007-714007-11, 11p
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7 . Conference
A novel method for characterizing resist performance.
저자
by
Van Steenwinckel, D.
;
Gronheid, R.
;
Lammers, J. H.
;
Meyers, A. M.
;
Van Roey, F.
, et al.
소스
Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65190V-65190V-11, 11p
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7 . Conference
Top coat or no top coat for immersion lithography?
저자
by
Stepanenko, N.
;
Kim, Hyun-Woo
;
Kishimura, S.
;
Van Den Heuvel, D.
;
Vandenbroeck, N.
, et al.
소스
Proceedings of SPIE; Nov2006, Issue 1, p615304-615304-17, 17p
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7 . Academic Journal
Dry development in an O
2
/SO
2
plasma for sub-0.18 μm top layer imaging processes.
저자
by
Goethals, A. M.
;
Van Roey, F.
;
Sugihara, T.
;
Van den hove, L.
;
Vertommen, J.
, et al.
소스
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 6, p3322-3333, 12p
Scopus
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7 . Periodical
Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology
저자
by
Sugihara, T.
;
Van Roey, F.
;
Goethals, A.M.
;
Ronse, K.
;
Van den hove, L.
.
소스
Microelectronic Engineering; May 1999, Vol. 46 Issue: 1-4 p339-343, 5p
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7 . Academic Journal
Status of EUV lithography at IMEC
저자
by
Goethals, A. M.
;
Jonckheere, R.
;
Lorusso, G. F.
;
Hermans, J.
;
Van Roey, F.
, et al.
소스
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
; 2007, 20 3, p383-p392, 10p.
Scopus
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