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1 . Academic Journal
Predicting Failure Distributions of SRAM Arrays by Using Extreme Value Statistic, Bit Cell Simulation, and Machine Learning
저자
by
Pompl, T.
;
Bashir, T.K.
;
Voelker, M.
;
Last, F.
;
Ostermayr, M.
.
소스
IEEE Transactions on Device and Materials Reliability IEEE Trans. Device Mater. Relib. Device and Materials Reliability, IEEE Transactions on. 23(3):363-369 Sep, 2023
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7 . Academic Journal
Extended Methodologies for Using Extreme Value Statistic for SRAM Vmin
저자
by
Pompl, T.
;
Henkel, S.
;
Stahl, J.
;
Ostermayr, M.
.
소스
IEEE Transactions on Device and Materials Reliability IEEE Trans. Device Mater. Relib. Device and Materials Reliability, IEEE Transactions on. 19(3):520-528 Sep, 2019
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6 . Academic Journal
Gate voltage and oxide thickness dependence of progressive wear-out of ultra-thin gate oxides
저자
by
Pompl, T.
;
Kerber, A.
;
Röhner, M.
;
Kerber, M.
.
소스
In
Microelectronics Reliability
2006 46(9):1603-1607
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6 . Academic Journal
Soft breakdown and hard breakdown in ultra-thin oxides
저자
by
Pompl, T.
;
Engel, C.
;
Wurzer, H.
;
Kerber, M.
.
소스
In
Microelectronics Reliability
2001 41(4):543-551
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6 . Conference
Practical aspects of reliability analysis for IC designs
저자
by
Pompl, T.
;
Schlunder, C.
;
Hommel, M.
;
Nielen, H.
;
Schneider, J.
.
소스
2006 43rd ACM/IEEE Design Automation Conference Design Automation Conference Design Automation Conference, 2006 43rd ACM/IEEE. :193-198 2006
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7 . Conference
Change of acceleration behavior of time-dependent dielectric breakdown by the BEOL process: indications for hydrogen induced transition in dominant degradation mechanism
저자
by
Pompl, T.
;
Allers, K.-H.
;
Schwab, R.
;
Hofmann, K.
;
Roehner, M.
.
소스
2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. Reliability physics Reliability Physics Symposium, 2005. Proceedings. 43rd Annual. 2005 IEEE International. :388-397 2005
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7 . Conference
65nm cmos technology for low power applications
저자
by
Steegen, A.
;
Mo, R.
;
Mann, R.
;
Sun, M.-C.
;
Eller, M.
, et al.
소스
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. International Electron Devices Meeting 2005 Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International. :64-67 2005
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7 . Academic Journal
Influence of gate oxide breakdown on MOSFET device operation
저자
by
Pompl, T.
;
Wurzer, H.
;
Kerber, M.
;
Eisele, I.
.
소스
In
Microelectronics Reliability
2000 40(1):37-47
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6 . Conference
Modeling of substrate related extrinsic oxide failure distributions
저자
by
Pompl, T.
;
Kerber, M.
;
Innertsberger, G.
;
Allers, K.-H.
;
Obry, M.
, et al.
소스
2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320) Reliability physics symposium Reliability Physics Symposium Proceedings, 2002. 40th Annual. :393-403 2002
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7 . Academic Journal
Correction to “Comprehensive Methodology for the Statistic of SRAM Vmin” [Sep 15 289-297]
저자
by
Pompl, T.
;
Strasser, R.
;
Drexl, S.
;
Ostermayr, M.
.
소스
IEEE Transactions on Device and Materials Reliability IEEE Trans. Device Mater. Relib. Device and Materials Reliability, IEEE Transactions on. 15(4):638-638 Dec, 2015
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