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1 . Conference
Dry Etching Damage In Pt/Pb(Zr, Ti)O3/Pt Capacitors Patterned By A Single Photolithography Process Step
저자
by
Kumihashi, T.
;
Kawakami, H.
;
Torii, K.
;
Suga, M.
;
Kure, T.
.
소스
2nd International Symposium on Plasma Process-Induced Damage Plasma Process-Induced Damage, 1997., 2nd International Symposium on. :221-224 1997
Full Text (IEEE)
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7 . Conference
Sub-Quarter-Micron PT Etching Technology Using Round Head EB Resist
저자
by
Yunogami, T.
;
Kumihashi, T.
.
소스
Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135) Microprocess and nanotechnology Microprocesses and Nanotechnology Conference, 1998 International. :340-341 1998
Full Text (IEEE)
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4 . Conference
A scalable single-transistor/single-capacitor memory cell structure characterized by an angled-capacitor layout for megabit FeRAMs
저자
by
Kachi, T.
;
Shoji, K.
;
Yamashita, H.
;
Kisu, T.
;
Torii, K.
, et al.
소스
1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) VLSI technology VLSI Technology, 1998. Digest of Technical Papers. 1998 Symposium on. :126-127 1998
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7 . Conference
A 7.03-/spl mu/m/sup 2/ Vcc/2-plate nonvolatile DRAM cell with a Pt/PZT/Pt/TiN capacitor patterned by one-mask dry etching
저자
by
Shoji, K.
;
Moniwa, M.
;
Yamashita, H.
;
Kisu, T.
;
Kaga, T.
, et al.
소스
1996 Symposium on VLSI Technology. Digest of Technical Papers VLSI technology VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on. :28-29 1996
Full Text (IEEE)
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7 . Conference
An etching model to predict minimum-microloading gas pressure
저자
by
Izawa, M.
;
Kumihashi, T.
;
Ohji, Y.
.
소스
1995 Symposium on VLSI Technology. Digest of Technical Papers VLSI technology VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on. :89-90 1995
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5 . Academic Journal
Surface migration as a determinate factor of the sticking coefficient derived from the chemisorption model.
저자
by
Izawa, M.
;
Kumihashi, T.
.
소스
Journal of Chemical Physics
. 12/1/1995, Vol. 103 Issue 21, p9418. 8p.
Web of Science
Scopus
JCR 저널정보
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4 . Conference
High-rate-gas-flow microwave plasma etching of silicon
저자
by
Tsujimoto, K.
;
Kumihashi, T.
;
Kohuji, N.
;
Tachi, S.
.
소스
1992 Symposium on VLSI Technology Digest of Technical Papers VLSI Technology, 1992. Digest of Technical Papers. 1992 Symposium on. :46-47 1992
Full Text (IEEE)
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6 . Conference
Dry Etching Damage In Pt/Pb(Zr, Ti)O/sub 3//Pt Capacitors Patterned By A Single Photolithography Process Step.
저자
by
Kumihashi, T.
;
Kawakami, H.
;
Torii, K.
;
Suga, M.
;
Kure, T.
.
소스
2nd International Symposium on Plasma Process-Induced Damage; 1997, p221-224, 4p
Full Text (IEEE)
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7 . Academic Journal
Process and properties of Pt/Pb(Zr, Ti)O 3 /Pt integrated ferroelectric capacitors.
저자
by
Torii, K.
;
Kawakami, H.
;
Miki, H.
;
Kushida, K.
;
Itoga, T.
, et al.
소스
Integrated Ferroelectrics; Apr1997, Vol. 16 Issue 1-4, p21-28, 8p
Web of Science
Scopus
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7 . Periodical
Process and properties of Pt/Pb(Zr, Ti)O3/Pt integrated ferroelectric capacitors
저자
by
Torii, K.
;
Kawakami, H.
;
Miki, H.
;
Kushida, K.
;
Itoga, T.
, et al.
소스
Integrated Ferroelectrics; April 1997, Vol. 16 Issue: 1 p21-28, 8p
Web of Science
Scopus
JCR 저널정보
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