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1 . Academic Journal
On mechanisms to control SiO2 etching kinetics in low-power reactive-ion etching process using CF4 + C4F8 + Ar + He plasma
저자
by
Choi, Gilyoung
;
Efremov, Alexander
;
Lee, Dae-Kug
;
Cho, Choong-Ho
;
Kwon, Kwang-Ho
.
소스
In
Vacuum
October 2023 216
Full Text (ScienceDirect)
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7 . Academic Journal
Gas-phase parameters and densities of atomic species in Cl2 + O2 + Ar plasma: Effects of O2/Ar and Cl2/Ar mixing ratios
저자
by
Efremov, Alexander
;
Amirov, Ildar
;
Izyumov, Mikhail
.
소스
In
Vacuum
January 2023 207
Full Text (ScienceDirect)
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5 . Academic Journal
On mechanisms influencing etching/polymerization balance in multi-component fluorocarbon gas mixtures
저자
by
Efremov, Alexander
;
Son, Hye Jun
;
Choi, Gilyoung
;
Kwon, Kwang-Ho
.
소스
In
Vacuum
December 2022 206
Full Text (ScienceDirect)
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6 . Academic Journal
A comparison of CF4, CBrF3 and C2Br2F4 plasmas: Physical parameters and densities of atomic species
저자
by
Miakonkikh, Andrey
;
Kuzmenko, Vitaly
;
Efremov, Alexander
;
Rudenko, Konstantin
.
소스
In
Vacuum
June 2022 200
Full Text (ScienceDirect)
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6 . Academic Journal
Etching kinetics and dielectric properties of SiOC films exposed to Ar and CF4 plasmas
저자
by
Oh, Younghun
;
Efremov, Alexander
;
Lee, Junmyung
;
Lee, Jongchan
;
Choi, Yeonsik
, et al.
소스
In
Thin Solid Films
1 May 2022 749
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7 . Academic Journal
Comparative study of CF
4
+ X + He (X = C
4
F
8
or C
4
H
2
F
6
) plasmas for high aspect ratio etching of SiO
2
with ACL mask.
저자
by
Choi, Gilyoung
;
Efremov, Alexander
;
Kwon, Kwang‐Ho
.
소스
Plasma Processes & Polymers
. Sep2024, Vol. 21 Issue 9, p1-11. 11p.
Web of Science
Scopus
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5 . Academic Journal
On the relationships between plasma chemistry, etching kinetics and etching residues in CF4+C4F8+Ar and CF4+CH2F2+Ar plasmas with various CF4/C4F8 and CF4/CH2F2 mixing ratios
저자
by
Lee, Jaemin
;
Efremov, Alexander
;
Kwon, Kwang-Ho
.
소스
In
Vacuum
February 2018 148:214-223
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5 . Academic Journal
A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications
저자
by
Chun, Inwoo
;
Efremov, Alexander
;
Yeom, Geun Young
;
Kwon, Kwang-Ho
.
소스
In
Thin Solid Films
31 March 2015 579:136-143
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6 . Academic Journal
Individual Effects of Various Plasma-Related Factors on the High Aspect Ratio Oxide Etching Process at Low-Frequency Bias Power Using an Inductively Coupled Plasma System.
저자
by
Son, Hye Jun
;
Efremov, Alexander
;
Choi, Gilyoung
;
Kwon, Kwang-Ho
.
소스
Plasma Chemistry & Plasma Processing; Jan2024, Vol. 44 Issue 1, p635-649, 15p
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6 . Conference
Synthesis of a Controller Built on the Principle of Inverse Dynamics and Identification of a Nonlinear Model of Longitudinal Motion in Offline Mode.
저자
by
Efremov, Alexander
;
Bikineeva, Alexandra
;
Korzun, Fedor
.
소스
E3S Web of Conferences; 11/16/2023, Vol. 446, p1-9, 9p
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