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1 . Academic Journal
Echocardiography predictors of sustained sinus rhythm after cardioversion of supraventricular arrhythmia in patients with septic shock
저자
by
Balik, M.
;
Waldauf, P.
;
Maly, M.
;
Brozek, T.
;
Rulisek, J.
, et al.
소스
In
Journal of Critical Care
October 2024 83
Full Text (Clinical Key)
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Web of Science
Scopus
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7 . Academic Journal
Application of e-Beam Voltage Contrast Technique for Overlay Improvement and Process Window Control in Multi-Patterning Interconnect Scheme
저자
by
Yang, L.
;
Li, R.
;
Hsu, I.
;
Zhang, H.
;
Ren, J.
, et al.
소스
IEEE Journal of the Electron Devices Society IEEE J. Electron Devices Soc. Electron Devices Society, IEEE Journal of the. 10:870-875 2022
Web of Science
Scopus
JCR 저널정보
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7 . Academic Journal
Design and Measurement Requirements for Short Flow Test Arrays to Characterize Emerging Memories
저자
by
Brozek, T.
;
Ciplickas, D.
.
소스
IEEE Journal of the Electron Devices Society IEEE J. Electron Devices Soc. Electron Devices Society, IEEE Journal of the. 7:1248-1257 2019
Web of Science
Scopus
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4 . Conference
Experimental comparison of wafer level reliability (WLR) and packaged electromigration tests
저자
by
Ryu, C.
;
Tse-Lun Tsai
;
Rogers, A.
;
Jesse, C.
;
Brozek, T.
, et al.
소스
2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167) Reliability physics symposium Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International. :189-193 2001
Full Text (IEEE)
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7 . Conference
Fowler-Nordheim and hot-carrier stress study of latent plasma charging damage in various 50 /spl Aring/ gate dielectrics
저자
by
Brozek, T.
;
Huber, J.
;
Walls, J.
.
소스
2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) Plasma process-induced damage Plasma Process-Induced Damage, 2000 5th International Symposium on. :89-92 2000
Full Text (IEEE)
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5 . Conference
New two-terminal transistor test structures and test methodology for assessment of latent charging damage
저자
by
Brozek, T.
.
소스
2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) Plasma process-induced damage Plasma Process-Induced Damage, 2000 5th International Symposium on. :149-152 2000
Full Text (IEEE)
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3 . Conference
Optimization of MOS capacitor based short flow for monitoring ion implantation-induced charging
저자
by
Brozek, T.
;
Norton, C.
.
소스
2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072) Advanced semiconductor manufacturing Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI. :387-391 2000
Full Text (IEEE)
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4 . Conference
Annealing of plasma charging damage and residual degradation in MOS transistors
저자
by
Brozek, T.
.
소스
1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) Plasma process-induced damage Plasma Process-Induced Damage, 1999 4th International Symposium on. :61-64 1999
Full Text (IEEE)
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3 . Conference
Effect of device type and plasma process on the oxide thickness dependence of plasma-induced charging damage
저자
by
Brozek, T.
;
Dao, T.
.
소스
1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) Plasma process-induced damage Plasma Process-Induced Damage, 1998 3rd International Symposium on. :46-49 1998
Full Text (IEEE)
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4 . Conference
Plasma process induced abnormal 1/f noise behavior in deep sub-micron MOSFETs
저자
by
Ramgopal Rao, V.
;
Wijeratne, G.
;
Chu, D.
;
Brozek, T.
;
Viswanathan, C.R.
.
소스
1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) Plasma process-induced damage Plasma Process-Induced Damage, 1998 3rd International Symposium on. :124-127 1998
Full Text (IEEE)
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