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1 . Academic Journal
Advanced Development Techniques for Extreme-Tight Pitch Patterning
저자
by
Hikari Tomori
;
Cong Que Dinh
;
Seiji Nagahara
;
Kanzo Kato
;
Shinichiro Kawakami
, et al.
소스
Journal of Photopolymer Science and Technology. 2024, 37(3):245-250
Open Access (JSTAGE)
Web of Science
Scopus
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7 . Academic Journal
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
저자
by
Alexandra Krawicz
;
Angélique Raley
;
Arnaud Dauendorffer
;
Cong Que Dinh
;
Danilo De Simone
, et al.
소스
Journal of Photopolymer Science and Technology. 2022, 35(1):87
Open Access (JSTAGE)
Web of Science
Scopus
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7 . Academic Journal
Approaches for 193 nm and 248 nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)
저자
by
Alberto Dioses
;
Alexandra Krawicz
;
Francis Houlihan
;
Joseph Oberlander
;
Kazuyoshi Ohta
, et al.
소스
Journal of Photopolymer Science and Technology. 2008, 21(3):383
Open Access (JSTAGE)
Web of Science
Scopus
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7 . Academic Journal
Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coating
저자
by
Alberto Dioses
;
Alexandra Krawicz
;
Andrew Romano
;
Francis Houlihan
;
HengPeng Wu
, et al.
소스
Journal of Photopolymer Science and Technology. 2007, 20(3):359
Open Access (JSTAGE)
Web of Science
Scopus
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7 .
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
저자
by
Cong Que Dinh
;
Seiji Nagahara
;
Yuhei Kuwahara
;
Arnaud Dauendorffer
;
Keisuke Yoshida
, et al.
소스
Journal of Photopolymer Science and Technology
. 35:87-93
Web of Science
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7 .
Holistic litho-etch development to address patterning challenges towards high NA EUV
저자
by
Seiji Nagahara
;
Arnaud Dauendorffer
;
Xiang Liu
;
Tomoya Onitsuka
;
Hisashi Genjima
, et al.
소스
International Conference on Extreme Ultraviolet Lithography 2022
.
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7 .
Coater/developer-based techniques to improve high-resolution EUV patterning
저자
by
Kanzo Kato
;
Lior Huli
;
David Hetzer
;
Steven Grzeskowiak
;
Alexandra Krawicz
, et al.
소스
International Conference on Extreme Ultraviolet Lithography 2022
.
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7 .
Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges
저자
by
Angélique Raley
;
Lior Huli
;
Steven Grzeskowiak
;
Katie Lutker-Lee
;
Alexandra Krawicz
, et al.
소스
Advanced Etch Technology and Process Integration for Nanopatterning XI
.
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7 .
Coater/developer and new underlayer application to sub-30nm process
저자
by
Dave Hetzer
;
Alexandra Krawicz
;
Luciana Meli
;
Alex Hubbard
;
Cody Murray
, et al.
소스
International Conference on Extreme Ultraviolet Lithography 2021
.
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7 . Academic Journal
Thickness, Surface Morphology, and Optical Properties of Porphyrin Multilayer Thin Films Assembled on Si(100) Using Copper(I)-Catalyzed AzideâAlkyne Cycloaddition.
저자
by
Peter K. B. Palomaki
;
Alexandra Krawicz
;
Peter H. Dinolfo
.
소스
Langmuir
. Apr2011, Vol. 27 Issue 8, p4613-4622. 10p.
Full Text (ACS)
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