Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp
- Resource Type
- Article
- Authors
- Muehlberger, M.; Boehm, M.; Bergmair, I.; Chouiki, M.; Schoeftner, R.; Kreindl, G.; Kast, M.; Treiblmayr, D.; Glinsner, T.; Miller, R.; Platzgummer, E.; Loeschner, H.; Joechl, P.; Eder-Kapl, S.; Narzt, T.; Lausecker, E.; Fromherz, T.
- Source
- In Microelectronic Engineering August 2011 88(8):2070-2073
- Subject
- Language
- ISSN
- 0167-9317