Real-time vacuum leak detection technology to calculate vacuum leak parameters for dry stripping : EO: Equipment Optimization
- Resource Type
- Conference
- Authors
- Jeong, Jaepyo; Ha, Taekyung; Ji, Hyojeong; Yoon, Sung Jin
- Source
- 2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2022 33rd Annual. :1-4 May, 2022
- Subject
- Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Productivity
Strips
Interpolation
Vacuum technology
Semiconductor device manufacture
Real-time systems
Leak detection
Real-time vacuum leak detection
PR dry strip
Leak-dependent parameters
- Language
- ISSN
- 2376-6697
In semiconductor manufacturing, vacuum leakage occurring during wafer processing decreases productivity. Conventionally, the equipment is stopped to detect the vacuum leaks. However, this adversely affects productivity. We presents a real-time vacuum leak detection technique. We successfully identified vacuum leakage in real time by interpolating from the dry strip process parameters.