Structural properties of nanorod zinc oxide thin films on Si substrate deposited by RF magnetron sputtering at room temperature
- Resource Type
- Conference
- Authors
- Shafura, A. K.; Sin, N. D. Md; Mamat, M. H.; Uzer, M; Mohamad, A.; Rusop, M.
- Source
- 2013 IEEE International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA) Smart Instrumentation, Measurement and Applications (ICSIMA), 2013 IEEE International Conference on. :1-4 Nov, 2013
- Subject
- Bioengineering
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Power, Energy and Industry Applications
Robotics and Control Systems
Zinc oxide
Radio frequency
Substrates
Sputtering
Silicon
Surface morphology
Films
nanorod zinc oxide RF power
RF magnetron sputtering
structural properties
- Language
Nanorod zinc oxide (ZnO) thin films have been successfully deposited using RF magnetron sputtering at room temperature. The RF power was varied and the effect on the surface characteristic of ZnO thin film was studied. The surface topography and morphology of the thin films were characterised using X-ray Diffractometer (XRD), Atomic Force Microscopy (AFM) and Field Emission Scanning Electron Microscopy (FESEM). The paper reveals the effect of RF power on the surface characteristic of ZnO thin film. The films deposited at a RF power of 250 W exhibited the best structural properties with good surface morphology.