Highly manufacturable 7nm FinFET technology featuring EUV lithography for low power and high performance applications
- Resource Type
- Conference
- Source
- 2017 Symposium on VLSI Technology VLSI Technology, 2017 Symposium on. :T68-T69 Jun, 2017
- Subject
Bioengineering Computing and Processing Photonics and Electrooptics Power, Energy and Industry Applications Lithography Logic gates FinFETs High definition video Resistance Metals - Language
- ISSN
- 2158-9682