Thin Film Processes: Abatement of Waste Gases from Plasma Assisted Material Processes
- Resource Type
- Conference
- Authors
- Jones, Christopher P.
- Source
- 2020 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2020 China. :1-3 Jun, 2020
- Subject
- Bioengineering
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Power, Energy and Industry Applications
Productivity
Gases
Semiconductor device measurement
Pollution
Pollution measurement
Reliability
Standards
- Language
This paper describes the challenges associated with the management of particulate matter (PM) that are generated during the abatement of waste gases from plasma-assisted thin-film semiconductor processes. We describe operational challenges associated with the PM management within the fab and mitigating strategies. From an environmental protection viewpoint, we describe the health risks associated with the inhalation of fine PM and the standards that are currently adopted both by central and local governments in China.