Design and characterization of Hall Plates in a 0.5μm CMOS process
- Resource Type
- Conference
- Authors
- Ronis, Nicolas; Garcia-Inza, Mariano
- Source
- 2016 Argentine Conference of Micro-Nanoelectronics, Technology and Applications (CAMTA) Micro-Nanoelectronics, Technology and Applications (CAMTA), Argentine Conference of. :56-61 Aug, 2016
- Subject
- Components, Circuits, Devices and Systems
Sensitivity
Temperature sensors
Temperature measurement
Magnetic fields
Geometry
Electric fields
Electrical resistance measurement
Hall Plate
CMOS design
Solid state magnetic field sensor
- Language
Four different N-well Hall Plate geometries were designed and fabricated in a 0.5μm CMOS process provided by MOSIS. Different shapes, sizes, contact distribution and dimensions were used in order to characterize Hall Plate sensitivity and resistance in a range of temperatures from −40°C up to 165°C. To remove the offset a four-phase current spinning method was used. The results show a better sensitivity performance in the cross-shaped whereas the small square shape has a slight improvement in the SNR behavior. The sensitivity of the different Hall Plate geometries was simulated using a model based on finite-element showing good agreement with the measurements.