Prototyping of Silicon Nitride Photonic Integrated Circuits using Electron Beam Lithography
- Resource Type
- Conference
- Authors
- Horvath, Cameron; Westwood-Bachman, Jocelyn N.; Setzer, Kevin; Naraine, Cameron M.; Mbonde, Hamidu M.; Frare, Bruno L. Segat; Bradley, Jonathan D. B.; Aktary, Mirwais
- Source
- 2022 Photonics North (PN) Photonics North (PN), 2022. :1-1 May, 2022
- Subject
- Aerospace
Bioengineering
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Transportation
Fabrication
Electron beams
Lithography
Photonic integrated circuits
Silicon nitride
Rapid prototyping
Silicon
silicon nitride
fabrication
photonic integrated circuits
- Language
- ISSN
- 2693-8316
We describe a rapid prototyping process for silicon nitride photonic integrated circuits. The prototyping platform is based on direct-write electron beam lithography technology and provides a route toward the rapid fabrication of chip-based passive and thermo-optic active photonic devices with critical resolution down to 100 nm.