Fabrication of a novel microcantilever probe with inverted pyramidal microdischarge for maskless scanning plasma etching
- Resource Type
- Conference
- Authors
- Wen, Li; Zhang, Qiu-Ping; Xiang, Wei-Wei; Wang, Hai; He, Li-Wen; Chu, Jia-Ru
- Source
- 2010 Symposium on Design Test Integration and Packaging of MEMS/MOEMS (DTIP) Design Test Integration and Packaging of MEMS/MOEMS (DTIP), 2010 Symposium on. :387-390 May, 2010
- Subject
- Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Signal Processing and Analysis
Power, Energy and Industry Applications
Robotics and Control Systems
Fabrication
Plasma applications
Etching
Sulfur hexafluoride
Inductors
Cathodes
Paper technology
Scanning probe microscopy
Optical materials
Plasma temperature
- Language
This paper presents a novel maskless microplasma etching method based on scanning probe microscopy. That is, an inverted pyramidal microdischarge is integrated into a hollow tip of a SiO 2 cantilever probe, and the generated microplasmas are ejected through the nano -aperture to realize maskless etching with nano -resolution and high efficiency. The SiO 2 cantilever with microdischarge and nano-aperture at the hollow tip is designed and successfully fabricated with good quality. Experiment results show that the devices can discharge in SF 6 gas stably. The electrical and optical characteristics of the microdischarge in SF 6 at the pressure of 3kPa∼15kPa are obtained. The simulation result of etching mechanism verifies the feasibility of silica-based material maskless etching.