Pioneering Fast and Safe Low-k Silicon Dioxide Synthesis for Modern Integrated Circuits
- Resource Type
- Periodical
- Source
- IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 37(2):185-189 May, 2024
- Subject
Components, Circuits, Devices and Systems Engineered Materials, Dielectrics and Plasmas Silicon compounds Silicon Substrates Ellipsometry Dielectric constant Oxidation Height measurement Dielectric films electronics industry plasma cvd - Language
- ISSN
- 0894-6507
1558-2345