光学器件的飞速发展对基体材料铌酸锂不断提出更高要求.为获得满足器件使用要求的超光滑、高平整晶片表面,采用化学机械抛光方法对铌酸锂进行加工.研究过程中,对负载压力、抛光布表面结构、抛光液流量、pH 值等工艺参数进行了优化调整,最终制备出平整度较高、表面粗糙度较小的铌酸锂抛光片.实验结果表明,选取 Suba 600抛光布、液流量3 mL/s、pH 值为10、底盘转速60 r/min、压力为0.16 MPa作为抛光工艺参数可获得高平整、超光滑的铌酸锂抛光片.平面度测量仪与原子力显微镜测试结果表明,所制备 LN抛光片的总厚度变化(TTV)为6.398 μm,粗糙度(Ra)为0.196 nm.
As the development of optical device,higher requirements were put forward to the basic material of lithium nio-bate.In this article,the method of chemical mechanical polishing was used to obtain the ultra-smooth and high planarization surface which satisfied the operating requirement of device.Loading pressure,surface structure of polishing cloth,flow and pH of polishing solution were optimized in the process of research.The LN wafer which has high flatness and small surface roughness was obtained at last.Experimental results show that the ultra-smooth and high planarization surface of lithium niobate can be obtained at the fol-lowing conditions (polishing cloth:Suba 600,flow of polishing solution:3 mL/s,pH:10,chassis rotation speed:60 r/min,pres-sure:0.16 MPa).The total thickness variation (TTV)and surface roughness (Ra)was 6.398 μm,0.196 nm,which measured by flatness measuring instrument and atomic force microscope respectively.