电子级多晶硅化学清洗表面氢氧 终端性能研究 / Study on Hydrogen and Oxygen Terminal Properties of Electronic Grade Polysilicon Chemical Cleaning Surface
- Resource Type
- Academic Journal
- Source
- 新型工业化 / The Journal of New Industrialization. 9(10):59-62
- Subject
电子级多晶硅 化学清洗 氢氧终端 - Language
- Chinese
- ISSN
- 2095-6649