Atomic layer deposition of metal-oxide thin films on cellulose fibers
- Resource Type
- Authors
- Panos Patsalas; Yitzhak Mastai; Yacov Carmiel; N. Pliatsikas; Ortal Lidor-Shalev
- Source
- Journal of Coordination Chemistry. 71:2043-2052
- Subject
- technology, industry, and agriculture
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
0104 chemical sciences
Nanomaterials
Atomic layer deposition
chemistry.chemical_compound
Cellulose fiber
Chemical engineering
X-ray photoelectron spectroscopy
chemistry
Materials Chemistry
Deposition (phase transition)
Physical and Theoretical Chemistry
Thin film
Cellulose
0210 nano-technology
Layer (electronics)
- Language
- ISSN
- 1029-0389
0095-8972
Atomic layer deposition (ALD) is a vapor-phase technique capable of producing inorganic thin films with precise control over the thickness of the film. The ALD method offers high precision in the design of advanced 3D nanostructures. In this article, silica and alumina thin films have been grown over fibers of cellulose by the ALD process. The morphology and the chemical composition of the fabricated thin films are characterized, as well as their thermal durability through elevated temperatures. Moreover, XPS is used to confirm the phases of the alumina nanofilms and to further understand the deposition process on the cellulose microfibers.