Simultaneous detection of intensity and polarization at the pixel-level has many important applications in the mid-infrared region. In this work a large-format aluminum wire grid micro polarizer array has been fabricated and tested on silicon substrates. The arrays were made on 150mm silicon wafers using a 193nm deep-UV stepper, with each array spanning over 1-million pixels. A unique multilayer design and a large-area nanoscale projection lithography combined with high-aspect ratio wire-grid structures were utilized to achieve optimum extinction coefficient and transmission. Measured extinction coefficients on test samples exceeded 30-dB, with maximum transmission around 90%. These arrays could be designed to match the focal-plane array geometry for integration with mid-IR imagers.