Perpendicular anisotropy of Co3Pt deposited on the NiFeMo/Ru buffer
- Resource Type
- Authors
- S.J. Suh; T.W. Lim; Seong-yong Yoon; Duhyun Lee; G.H. Jeong
- Source
- Journal of Magnetism and Magnetic Materials. 304:e59-e61
- Subject
- Materials science
business.industry
Perpendicular magnetic anisotropy
Condensed Matter Physics
Buffer (optical fiber)
Electronic, Optical and Magnetic Materials
Magnetic anisotropy
Optics
Sputtering
Perpendicular anisotropy
Wafer
Texture (crystalline)
Composite material
business
Layer (electronics)
- Language
- ISSN
- 0304-8853
The multilayer of Ta/NiFeMo/Ru/Co3Pt was sputter deposited on the Si (1 0 0) wafer. Using the NiFeMo buffer layer greatly enhanced the texture of Co3Pt layer. The enhanced texture increased the perpendicular magnetic anisotropy of Co3Pt. According to the VSM and XRD results, only the 5 nm of NiFeMo was good enough to produce the texture and perpendicular anisotropy in Co3Pt layer. The perpendicular anisotropy was attributed to the existence of short-range-ordered HCP structure of Co3Pt.