Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor
- Resource Type
- Authors
- Majed A. Alrefae; Siva Sashank Tholeti; Gayathri Shivkumar; Timothy S. Fisher; Alina Alexeenko
- Source
- Journal of Applied Physics. 119:113301
- Subject
- 010302 applied physics
Work (thermodynamics)
Hydrogen
Chemistry
Multiphysics
Analytical chemistry
General Physics and Astronomy
chemistry.chemical_element
02 engineering and technology
Plasma
021001 nanoscience & nanotechnology
01 natural sciences
7. Clean energy
Finite element method
Computational physics
symbols.namesake
Maxwell's equations
0103 physical sciences
Heat transfer
symbols
Plasma diagnostics
0210 nano-technology
- Language
- ISSN
- 1089-7550
0021-8979
The aim of this work is to build a numerical model of hydrogen plasma inside a microwave plasma chemical vapor deposition system. This model will help in understanding and optimizing the conditions for the growth of carbon nanostructures. A 2D axisymmetric model of the system is implemented using the finite element high frequency Maxwell solver and the heat transfer solver in COMSOL Multiphysics. The system is modeled to study variation in parameters with reactor geometry, microwave power, and gas pressure. The results are compared with experimental measurements from the Q-branch of the H2 Fulcher band of hydrogen using an optical emission spectroscopy technique. The parameter γ in Funer's model is calibrated to match experimental observations at a power of 500 W and 30 Torr. Good agreement is found between the modeling and experimental results for a wide range of powers and pressures. The gas temperature exhibits a weak dependence on power and a strong dependence on gas pressure. The inclusion of a verti...