Design and performance of a new VUV photoemission beamline at Hefei Light Source
- Resource Type
- Authors
- Zhe Sun; Guobin Zhang; Shengtao Cui; Zhengkun Liu; Suyun Zhu; Kong Shuai; Wu Xibo; Sailong Ju
- Source
- Journal of Electron Spectroscopy and Related Phenomena. 196:31-33
- Subject
- Radiation
Photon
Materials science
Photoemission spectroscopy
business.industry
Synchrotron light source
Grating
Undulator
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
law.invention
Optics
Beamline
law
Emission spectrum
Physical and Theoretical Chemistry
business
Spectroscopy
Monochromator
- Language
- ISSN
- 0368-2048
A new undulator-based beamline with a grazing incident spherical grating monochromator (SGM) has been constructed to investigate photoemission spectroscopy in solids in 5–45 eV energy regions at Hefei 0.8 GeV synchrotron light source (HLS). The beamline should deliver a photon flux higher than 1011 phs/s on sample at an energy resolve power of about 10,000. The spot size on sample should be small than 1 mm ( h ) × 0.5 mm ( v ).