A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments
- Resource Type
- Source
- IET Circuits, Devices & Systems. 15:310-329
- Subject
Minimisation (psychology) Optics Control and Systems Engineering law business.industry Computer science Extreme ultraviolet lithography Electrical and Electronic Engineering business Flare law.invention - Language
- ISSN
- 1751-8598
1751-858X