Radio frequency magnetron sputtering deposition of hetero-epitaxial strontium barium niobate thin films (SrxBa1-xNb2O6)
- Resource Type
- Authors
- M. Cuniot-Ponsard; J. M. Desvignes; Eric Leroy; B. Ea-Kim
- Source
- Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2003, 93 (3), pp.1718-1724. ⟨10.1063/1.1535749⟩
- Subject
- 010302 applied physics
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]
Materials science
business.industry
Ferroelectric ceramics
General Physics and Astronomy
Mineralogy
02 engineering and technology
Strontium barium niobate
Sputter deposition
021001 nanoscience & nanotechnology
Epitaxy
01 natural sciences
chemistry.chemical_compound
chemistry
Sputtering
0103 physical sciences
Optoelectronics
Thin film
0210 nano-technology
business
Stoichiometry
Deposition (law)
- Language
- Spanish; Castilian
- ISSN
- 0021-8979
1089-7550
International audience; Excellent electro-optic properties of SrxBa1−xNb2O6 crystals (SBN:x) motivate the attempts to control the deposition of high ordered SBN thin films with the aim of optical waveguiding and processing integration. We have examined the ability of sputtering techniques to deposit stoichiometric SBN thin films. Composition analysis has enabled us to probe the mechanisms which control the target-film composition transfer and to define an experimental strategy for stoichiometry control. Epitaxial (001) SBN thin films have been obtained on MgO (100) substrates, which exhibit two in-plane orientations (±31°) mirror symmetric to the MgO cell axis.