Effects of nitrogen pressure and ion flux on the properties of direct current reactive magnetron sputtered Zr-N films.
- Resource Type
- Article
- Source
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 6, p2808-2813, 6p
- Subject
- Language
- ISSN
- 07342101