High-resolution DUV inspection system for 150-nm generation masks.
- Resource Type
- Article
- Authors
- Tabata, Mitsuo; Tsuchiya, Hideo; Sanada, Yasushi; Nishizaka, Takeshi; Hirazawa, Hiroaki; Kobayashi, Noboru; Nagai, Hideo; Watanabe, Tomohide; Oohashi, Katsuki; Inoue, Hiromu; Nomura, Takehiko; Ono, Akira
- Source
- Proceedings of SPIE; Nov1999, Issue 1, p138-146, 9p
- Subject
- Language
- ISSN
- 0277786X