Study of AlN Epitaxial Growth on Si (111) Substrate Using Pulsed Metal–Organic Chemical Vapour Deposition.
- Resource Type
- Article
- Source
- Crystals (2073-4352); Apr2024, Vol. 14 Issue 4, p371, 11p
- Subject
METAL organic chemical vapor deposition ALUMINUM nitride films EPITAXY SILICON nitride films FIELD emission electron microscopy ALUMINUM nitride - Language
- ISSN
- 20734352