Magnetoresistance of nickel nanocontacts fabricated by different methods.
- Resource Type
- Article
- Authors
- Wei, H.-X.; Wang, T.-X.; Clifford, E.; Langford, R. M.; Han, X.-F.; Coey, J. M. D.
- Source
- Journal of Applied Physics. 4/15/2006, Vol. 99 Issue 8, p08C512. 3p. 1 Black and White Photograph, 1 Diagram, 1 Graph.
- Subject
- *MAGNETORESISTANCE
*NICKEL
*ELECTRIC resistance
*ATOMIC force microscopy
*SILICON nitride
- Language
- ISSN
- 0021-8979
Nickel nanocontacts have been fabricated by focused ion-beam (FIB) milling of e-beam patterned planar contacts, FIB milling of conical-shaped nanoperforations in a silicon nitride membrane, and nanoimprinting using an atomic force microscope. Their sizes ranged from 1 to 30 nm. Magnetoresistance of up to 3% is developed in a field of a few millitesla. This is interpreted in terms of ballistic magnetoresistance across a wide domain wall whose structure is determined by dipolar interactions at the contact. [ABSTRACT FROM AUTHOR]