Cross-linked Polymer Replica of a Nanoimprint Mold at 30 nm Half-pitch.
- Resource Type
- Article
- Authors
- Ge; H.; Wu; W.; Li; Z.; Jung; G.-Y.; Olynick; D.; Chen; Y.; Liddle; J. A.; Wang; S.-Y.; Williams; R. S.
- Source
- Nano Letters. Jan2005, Vol. 5 Issue 1, p179-182. 4p.
- Subject
- *LITHOGRAPHY
*POLYMERS
*MACROMOLECULES
*NANOSTRUCTURES
- Language
- ISSN
- 1530-6984
This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O2 plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography. [ABSTRACT FROM AUTHOR]