High Precision Alignment in Multi-Layer NanoImprint Lithography.
- Resource Type
- Article
- Authors
- Mühlberger, M.; Schwinger, W.; Gmainer, M.; Schöftner, R.; Glinsner, T.; Hasenfuß, Ch.; Hingerl, K.; Schmidt, H.; Kley, E.-B.
- Source
- AIP Conference Proceedings. 2007, Vol. 893 Issue 1, p1495-1496. 2p. 2 Black and White Photographs.
- Subject
- *NANOSTRUCTURES
*LITHOGRAPHY
*OPTICAL tooling
*PRINTS
*PHYSICS
- Language
- ISSN
- 0094-243X
Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative simplicity of the marker-design and the whole setup combined with the possibility of an upgrade of existing equipment and still ultra-high precision alignment capabilities. © 2007 American Institute of Physics [ABSTRACT FROM AUTHOR]