In order to identify a volatile metallo-organic precursor for the deposition of nickel films for CVD applications, equilibrium vapour pressure (pe) measurements were carried out on a N,N′-ethylenebis(2,4-pentanedion-iminoato)nickel(II) (Ni[(acac)2en]) by employing a TG-based transpiration method over the range 406 to 495 K leading to values of 118.0±4.1 and 83.3±3.8 kJ mol-1 for the standard enthalpies of sublimation and vapourisation, respectively of Ni[(acac)2en]. From the plot of log pe against 1/T, the melting point was derived to be 463 K, which is in reasonable agreement with 469±3 K reported in the literature and was also observed in DTA and melting point studies. [Copyright &y& Elsevier]