Inductively-coupled-plasma mass spectroscopy is a powerful technique for measuring trace levels of radioactive contaminants, specifically Th and U, in materials for use in construction of low-background rare-event detectors such as double beta decay and dark matter detectors. I describe here a technique for measuring Th and U contamination in copper by using direct acid digestion and dilution without further chemical processing, achieving results comparable to those achieved in previous work [1, 2] which utilized more complex chemical pre-concentration techniques. A convenient research-oriented analysis environment is described as well. Results are presented for measurements of three samples from the production line of electrolytically-purified, LME (London Metal Exchange) grade A, NA-ESN Aurubis copper. Purified samples showed levels consistent with zero contamination for both elements, while weak, but inconclusive, indications of contamination were present for the unpurified anode copper. The best limits achieved are near 1∙10−12g/g(95% CL) for both Th and U measured for copper from the cathode of the purification process.