Study on defocus image-based template matching algorithm for extreme ultraviolet mask phase defect detection
- Resource Type
- Conference
- Authors
- Han, Xiaoquan; Ji, Yiwen; Wu, Xiaobin; Ma, He; Xie, Wanlu; Sha, Pengfei
- Source
- 2022 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2022 International Workshop on. :1-4 Oct, 2022
- Subject
- Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Photonics and Electrooptics
Diffraction
Ultraviolet sources
Conferences
Imaging
Light fields
Pattern matching
Lenses
EUV
Phase Defect
Image Processing
Template matching Algorithm
- Language
In this paper, rigorous simulation and aerial imaging simulation were carried out for phase defects of EUV mask to obtain typical images of different types of phase defects. On this basis, a template matching algorithm based on defocus imaging was proposed to detect EUV mask phase defect and achieve a high detection rate of defects. It has good guidance and application value for the defect detection of extreme ultraviolet mask blank.