Microstructural evolution of the abnormal crystallite grains in sputtered ScAlN film for piezo-MEMS applications
- Resource Type
- Conference
- Authors
- Li, Minghua; Xie, Jielin; Chen, Bangtao; Wang, Nan; Zhu, Yao
- Source
- 2019 IEEE International Ultrasonics Symposium (IUS) Ultrasonics Symposium (IUS), 2019 IEEE International. :1124-1126 Oct, 2019
- Subject
- Bioengineering
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Signal Processing and Analysis
Substrates
Strain
Aluminum nitride
Surface morphology
Sputtering
Lattices
Stacking
Scandium aluminum nitride
reactive sputtering
abnormal grains
stacking fault
nucleation and growth
- Language
- ISSN
- 1948-5727
Scandium aluminum nitride (ScAlN) thin film has received wide attention for high performance piezo-MEMS device development. This work studies the large-size abnormal grains in the reactive sputtered ScAlN films. Our experimental results prove the abnormal grain nucleates in the normal film matrix and grows larger along the film thickness direction. The local in-plane strain induced by the lattice deformation results in atomic stacking fault, which is suggested to drive the abnormal nucleation.