Amplification of DUV solid-state laser pulse using ArF laser
- Resource Type
- Conference
- Authors
- Arakawa, Masaki; Tamaru, Yuki; Fuchimukai, Atsushi; Sasaki, Yoichi; Onose, Takashi; Tamiya, Mitsuru; Miura, Taisuke; Nakazato, Tomoharu; Watanabe, Shuntaro; Matsunaga, Takashi
- Source
- 2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC, 2017 Conference on). :1-1 Jun, 2017
- Subject
- Bioengineering
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
General Topics for Engineers
Photonics and Electrooptics
Optical fiber amplifiers
Semiconductor lasers
Laser beams
Measurement by laser beam
Power lasers
Laser theory
- Language
Deep ultra violet (DUV) lasers are actively used for material micro processing and semiconductor lithography. Argon fluoride excimer laser (ArF excimer laser) is the typical light source which can generate above 100-W optical power at the wavelength of below 200-nm. Using all-solid-state DUV light source as a seed laser and amplifying by ArF excimer, both high average power and high beam quality can be realized in the DUV region [1]. In this paper, we report on the output characteristics of hybrid ArF excimer laser.