Stimulated Emission Depletion (STED)lithography is generally recognized as a very promising tool to overcome the Abbe diffraction limit and manufacture 3D submicron features using a mask-less lithography step. It has been shown to be able to create 100 nm resolution, 10 nm feature size features in a polymer resin. However, STED is not widely used in Industry (or even Academia), because of its relative slow manufacturing speed. At TNO the goal of the current STED project is to combine high resolution features with high writing speeds (m/s).