Capping layers, cleaning method, and rapid thermal processing temperature on cobalt silicide formation.
- Resource Type
- Article
- Authors
- Saigal, Dinesh; Lai, Gigi; Yang, Lisa; Su, Jingang; Ngan, Ken; Narasimhan, Murali K.; Chen, Fusen E.; Singhal, Ajay; Lopes, Dave; Lian, Sean; Cao, Wanqing; Tsai, Kevin; Lo, Patrick; Lee, Shih-Ked; Shih, James
- Source
- Proceedings of SPIE; Nov1999, Issue 1, p84-95, 12p
- Subject
- Language
- ISSN
- 0277786X