Planar Inductively Coupled Plasmas Operated with Low and High Radio Frequencies.
- Resource Type
- Article
- Authors
- Tuszewski, Michel
- Source
- IEEE Transactions on Plasma Science. Feb99, Vol. 27 Issue 1, p68. 2p. 1 Color Photograph, 1 Diagram.
- Subject
- *INDUCTIVELY coupled plasma spectrometry
*SEMICONDUCTOR industry
- Language
- ISSN
- 0093-3813
Presents information on a study which investigated etching processes in the semiconductor industry using planar inductively coupled plasmas. Experimental details; Results and discussion.