Physical Properties of an Ultrathin Al2 O3 /HfO2 Composite Film by Atomic Layer Deposition and the Application in Thin-Film Transistors.
- Resource Type
- Article
- Source
- ACS Applied Materials & Interfaces; 4/5/2023, Vol. 15 Issue 13, p16874-16881, 8p
- Subject
- Language
- ISSN
- 19448244