Patterning at the Resolution Limit of Commercial Electron Beam Lithography.
- Resource Type
- Article
- Authors
- Saifullah, Mohammad S. M.; Asbahi, Mohamed; Neo, Darren C. J.; Mahfoud, Zackaria; Tan, Hui Ru; Ha, Son Tung; Dwivedi, Neeraj; Dutta, Tanmay; bin Dolmanan, Surani; Aabdin, Zainul; Bosman, Michel; Ganesan, Ramakrishnan; Tripathy, Sudhiranjan; Hasko, David G.; Valiyaveettil, Suresh
- Source
- Nano Letters; 9/28/2022, Vol. 22 Issue 18, p7432-7440, 9p
- Subject
- Language
- ISSN
- 15306984