Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti 2 N Films Deposited by RF-Magnetron Sputtering.
- Resource Type
- Article
- Source
- Metals (2075-4701); Aug2022, Vol. 12 Issue 8, p1237-1237, 14p
- Subject
TITANIUM nitride CARBON steel IMPEDANCE spectroscopy WEAR resistance CHEMICAL stability WORK structure - Language
- ISSN
- 20754701