Selective Digital Etching of Silicon–Germanium Using Nitric and Hydrofluoric Acids.
- Resource Type
- Article
- Authors
- Li, Chen; Zhu, Huilong; Zhang, Yongkui; Yin, Xiaogen; Jia, Kunpeng; Li, Junjie; Wang, Guilei; Kong, Zhenzhen; Du, Anyan; Yang, Tengzhi; Zhao, Liheng; Huang, Weixing; Xie, Lu; Li, Yangyang; Ai, Xuezheng; Ma, Shishuai; Radamson, Henry H.
- Source
- ACS Applied Materials & Interfaces; 10/21/2020, Vol. 12 Issue 42, p48170-48178, 9p
- Subject
- Language
- ISSN
- 19448244