Journal of the Electrochemical Society 149 (2002): 376–378. doi:10.1149/1.1479163 info:cnr-pdr/source/autori:Fazio B, Vulpio M, Gerardi C, Liao Y, Crupi I, Lombardo S, Trusso S, Neri F/titolo:Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing/doi:10.1149%2F1.1479163/rivista:Journal of the Electrochemical Society/anno:2002/pagina_da:376/pagina_a:378/intervallo_pagine:376–378/volume:149 Journal of the Electrochemical Society (Online) 149 (2002): G376–G378. doi:10.1149/1.1479163 info:cnr-pdr/source/autori:Fazio, B.a, Vulpio, M.a, Gerardi, C.a, Liao, Y.b, Crupi, I.b, Lombardo, S.b, Trusso, S.c, Neri, F.d/titolo:Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing/doi:10.1149%2F1.1479163/rivista:Journal of the Electrochemical Society (Online)/anno:2002/pagina_da:G376/pagina_a:G378/intervallo_pagine:G376–G378/volume:149
Design and Fabrication of Planar Optical Waveguide Devices and Materials, Seattle, WA United States, 8-9 July 2002 info:cnr-pdr/source/autori:Gonçalves, R.R.a, Carturan, G.a, Scarpari, S.b, Oliveira, D.C.b, Bueno, L.A.b, Ribeiro, S.J.L.b, Messaddeq, Y.b, Ferrari, M.c, Montagna, M.d, Rainho, J.P.e, Carlos, L.D.e/congresso_nome:Design and Fabrication of Planar Optical Waveguide Devices and Materials/congresso_luogo:Seattle, WA United States/congresso_data:8-9 July 2002/anno:2002/pagina_da:/pagina_a:/intervallo_pagine Design and Fabrication of Planar Optical Waveguide Devices and Materials, pp. 134–139, Seattle, WA United States, 8-9 July 2002 info:cnr-pdr/source/autori:Gonçalves, R.R.a, Carturan, G.a, Scarpari, S.b, Oliveira, D.C.b, Bueno, L.A.b, Ribeiro, S.J.L.b, Messaddeq, Y.b, Ferrari, M.c, Montagna, M.d, Rainho, J.P.e, Carlos, L.D.e/congresso_nome:Design and Fabrication of Planar Optical Waveguide Devices and Materials/congresso_luogo:Seattle, WA United States/congresso_data:8-9 July 2002/anno:2002/pagina_da:134/pagina_a:139/intervallo_pagine:134–139