Time-dependent dielectric breakdown characterization of 90-and 65-nm-node Cu/SiOC interconnects with via plugs
- Resource Type
- Journal
- Authors
- Ueno, Kazuyoshi; Kameyama, Akiko; Matsumoto, Akira; Iguchi, Manabu; Takewaki, Toshiyuki; Oshida, Daisuke; Toyoshima, Hironori; Kawahara, Naoyoshi; Asada, Susumu; Suzuki, Mieko; Oda, Noriaki
- Source
- JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS; APR 2007, 46 4A, p1444-p1451, 8p.
- Subject
- Language
- English
- ISSN
- 00214922