We propose a highly directional waveguide grating antenna for an optical phased array, achieving high directionality of more than 97% by interleaving the trenches with different etching depths in the silicon nitride layer, and adopting a multilayered structure. Meanwhile, the multilayered structure reduces the perturbation strength, which enables a centimeter-scale radiation length. The beam-steering range is 13.2°, with a wavelength bandwidth of 100 nm. The 1-dB bandwidth of the grating is 305 nm. The multilayered grating structure has a large tolerance to the fabrication variation and is compatible with CMOS fabrication techniques.