Filtered Plasma Deposition and MEVVA Ion Implantation
- Resource Type
- Academic Journal
- Authors
- A. D. Liu; H. X. Zhang; T. H. Zhang
- Source
- Applied Science and Convergence Technology. 2003-10 12(S1):46-48
- Subject
- Language
- Korean
- ISSN
- 1225-8822
2288-6559
The modification of metal surface by ion implantation with MEVVA ion implanter and thin film deposition with filtered vacuum arc plasma device is introduced in this paper. The combination of ion implantation and thin film deposition is proved as a better method to improve properties of metal surface.